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Andrew John Mckerrow
Andrew John Mckerrow
Lam Research
High fidelity
Dry etching
Critical dimension
research findings
Process engineering
2
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1
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2024
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Holistic Integrated Process Solutions for Patterning Phase Change Memory Devices
2021
John Hoang
Meihua Shen
Thorsten Lill
Danna Qian
Aaron Routzahn
Jack Kun-Chieh Chen
Nick Altieri
Anthony Yu
Dulkin Alexander
Jim Sims
Andrew John Mckerrow
Rafal Dylewicz
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Review on recent progress in patterning phase change materials
2020
Journal of Vacuum Science and Technology
Meihua Shen
Thorsten Lill
Nick Altieri
John Hoang
Steven Chiou
Jim Sims
Andrew John Mckerrow
Rafal Dylewicz
Ernest Chen
Hamid Razavi
Jane P. Chang
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