Diffraction properties of a 0.24-μm period multilayer laminar amplitude grating in the soft x-ray region

We report on the fabrication of a laminar multilayer amplitude grating, characterization in the soft x-ray region, and modeling of its properties. Holographic lithography was used to produce a 0.24-μm spatial period grating on a triode sputtered Mo/C multilayer mirror. The pattern was transferred into the multilayer mirror by reactive ion etching in an SF 6 plasma after an intermediate lift-off step. The position and relative efficiency of the different orders of a grating etched down to the silicon substrate were measured at the Cu L αβ line (1.33 nm). The results were interpreted in the framework of a scalar kinematic diffraction theory.