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High performance gate stack fabrication process of Ge MOS structure for future electronic devices
High performance gate stack fabrication process of Ge MOS structure for future electronic devices
2018
Haruka Fujiwara
Hiroshi Yamada
Mitaro Namiki
Tomo Ueno
Yoshitaka Iwazaki
Keywords:
Electronic engineering
Fabrication
Electronics
Materials science
gate stack
Optoelectronics
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