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Ultrathin Al Oxide Seed Layer for Atomic Layer Deposition of High-$\kappa$ Al$_{2}$O$_{3}$ Dielectrics on Graphene
Ultrathin Al Oxide Seed Layer for Atomic Layer Deposition of High-$\kappa$ Al$_{2}$O$_{3}$ Dielectrics on Graphene
2020
Hang Yang
Wei Chen
Ming-Yang Li
Feng Xiong
Guang Wang
Sen Zhang
Chuyun Deng
Gang Peng
and Shi-Qiao Qin
Keywords:
Atomic physics
Optoelectronics
Oxide
Atomic layer deposition
Dielectric
Physics
Graphene
Correction
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