Defect Control in Zinc Oxynitride Semiconductor for High-Performance and High-Stability Thin-Film Transistors

The fabrication of thin-film transistor devices incorporating active semiconductors based on zinc oxynitride (ZnON) compound is presented. It is demonstrated that the addition of appropriate dopant, gallium, in ZnON, suppresses the formation of shallow donor, nitrogen vacancies, and significantly improves electrical characteristics of the resulting TFT. The Ga:ZnON devices with field-effect mobility values exceeding 50 cm2/Vs are achieved, which makes them suitable as switching or driving elements in next-generation flat-panel displays.