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Suppression of Cu Ion Drift by Metal-Cap on Cu lines, Improving Interconnect Dielectric Reliability
Suppression of Cu Ion Drift by Metal-Cap on Cu lines, Improving Interconnect Dielectric Reliability
2014
M. Ueki
N. Furutake
N. Inoue
Y Hayashi
Keywords:
Dielectric
Ion
Metal
Composite material
Analytical chemistry
Materials science
Interconnection
dielectric reliability
Optoelectronics
Correction
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