Performance of the full field EUV systems
2008
The ASML extreme ultraviolet lithography (EUV) alpha demo tool is a 0.25NA fully functional lithography tool with a
field size of 26×33 mm 2 , enabling process development for sub-40-nm technology. Two exposure tools are installed at
customer facilities, and are equipped with a Sn discharge source. In this paper we present data measured at intermediate
focus of the Sn source-collector module. We also present performance data from both exposure tools, show the latest
results of resist exposures including excellent 32-nm half pitch dense staggered and aligned contact hole images, and
present the highlights of the first demonstration of an electrically functional full field device with one of the layers made
using EUVL in ASML's alpha demo tool.
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