Fabrication And Test Of Soft X-Ray Multilayer Diffraction Gratings

Holographic lithography was used to produce a 0.36 μm spatial period grating on top of a Mo/C layered synthetic microstructure. The pattern was transferred to the multilayer mirror by reactive ion etching. The performance of the device has been evaluated at the Cu.Lα,β3 wavelength ( 1.33 nm ). A simple theoretical model explains the main features of the diffraction efficiency of the soft X-ray highly dispersive multilayer mirror.