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Atomic Layer Etching of Silicon Oxide with CF3I and O2 Plasma
Atomic Layer Etching of Silicon Oxide with CF3I and O2 Plasma
2020
Seon-Yong Kim
Taehoon Lee
In-Sung Park
Jinho Ahn
Keywords:
Silicon oxide
Optoelectronics
Materials science
Etching
o2 plasma
Correction
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