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[Paper] High Temperature Tolerant Barrier Films with Stacking Barrier Layers by Sputtering and ALD
[Paper] High Temperature Tolerant Barrier Films with Stacking Barrier Layers by Sputtering and ALD
2021
Toshinao Yuki
Takahiro Nishikawa
Miho Sugimoto
Hitoshi Nakada
Mitsuhiro Koden
Keywords:
Optoelectronics
Stacking
Sputtering
Computer science
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