A method for the determination of substrate temperature during thin film coating deposition
2008
The substrate temperature is one of the key parameters, which determines the optical properties of deposited dielectric
coatings. Depending on the employed material and application, the accurate knowledge of the substrate temperature is
crucial for the system performance. Currently, the heating process inside the evacuated deposition plant is usually
performed by radiation sources. The temperature of the substrates is governed be their emission and absorption
characteristics and in minor degree, by heat conduction to the substrate holders. Pyrometric methods and temperature
sensors are commonly used to measure the temperature close to the substrates. In any case, the measured temperature
can deviate extremely from the real substrate temperature. In particular, if materials with a high transmittance in the IR
range are used, the heating process can be controlled only with a large error by the conventional methods.
In this contribution, an adapted method using optical characterisation of the substrate is presented to determine precisely
the substrate temperature. In the described method, the optical transmittance of the components is measured and the
absorption characteristic in the VUV and visible spectral range is used to evaluate the current substrate temperature.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI