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Impact of EUV lithography line edge roughness on 16 nm memory generation
Impact of EUV lithography line edge roughness on 16 nm memory generation
2011
cultureman Vaglio Pret
P. Poliakov
Davide Bianchi
Roel Gronheid
Pieter Blomme
Miguel Miranda Corbalan
Jan Van Houdt
Wim Dehaene
Keywords:
Surface finish
Immersion lithography
Optics
Multiple patterning
Next-generation lithography
Extreme ultraviolet lithography
Materials science
Optoelectronics
line edge roughness
Correction
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