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Novel High Sensitivity EUV Photoresist for Sub-7 nm Node
Novel High Sensitivity EUV Photoresist for Sub-7 nm Node
2016
Tomoki Nagai
Hisashi Nakagawa
Takehiko Naruoka
Satoshi Dei
Seiichi Tagawa
Akihiro Oshima
Seiji Nagahara
Gosuke Shiraishi
Kosuke Yoshihara
Yuichi Terashita
Yukie Minekawa
Elizabeth Buitrago
Yasin Ekinci
Oktay Yildirim
Marieke Meeuwissen
Rik Hoefnagels
Gijsbert Rispens
Coen Verspaget
R. Maas
Keywords:
Photochemistry
Photoresist
Immersion lithography
Analytical chemistry
Materials science
Extreme ultraviolet lithography
Optoelectronics
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