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Plasma Etching Pre-treatment for a TEM Lamella Preparation of 3D NAND with High Aspect Ratio
Plasma Etching Pre-treatment for a TEM Lamella Preparation of 3D NAND with High Aspect Ratio
2021
Yu-Chih Chen
Bing-chang Li
Pei-Ling Hsu
Tsung-Yi Lin
I-An Chen
Chun-Hung Lin
Hsin-Cheng Hsu
Chin-Chih Yeh
Nan-Tzu Lian
Ta-Hone Yang
Kuang-Chao Chen
Keywords:
pre treatment
NAND gate
Plasma etching
Lamella (surface anatomy)
Materials science
Composite material
Correction
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