Studies of ferroelectric film growth and capacitor interface processes via insitu analytical techniques and correlation with electrical properties

Abstract Precise control of composition and microstructure of multicomponent oxide thin films is critical for the production of ferroelectric and high dielectric constant thin film devices. In addition, the integration of film-based capacitors with semiconductor substrates, for device fabrication, requires good control of the composition and structureof the dielectric/substrate and top electrode / dielectric interfaces to control the capacitor properties. In order to understand the processes described above, we are using a variety of integrated complementary in situ analytical techniques including time-of-flight ion scattering and recoil spectroscopy, X-ray photoelectron spectroscopy, spectroscopic ellipsometry, and ex situ methods such as transmission electron microscopy, scanning force microscopy, and scanning electron microscopy. Examples of studies recently performed by our group that are reviewed here include: (a) effects of microstructure on the oxidation of Ti-Al layers that can be used in a dual f...