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Characterization of silicon oxynitride filmsdeposited by HIPIMS deposition technique
Characterization of silicon oxynitride filmsdeposited by HIPIMS deposition technique
2020
Bo-Huei Liao
Chien Nan Hsiao
Ming-Hua Shiao
Sheng-Hui Chen
Keywords:
Silicon oxynitride
Deposition (law)
Physics
Optoelectronics
High-power impulse magnetron sputtering
Correction
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