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Projection optics for EUVL micro-field exposure tools with a numerical aperture of 0.5
Projection optics for EUVL micro-field exposure tools with a numerical aperture of 0.5
2013
Holger Glatzel
Dominic Ashworth
Mark Bremer
Rodney Chin
Kevin Cummings
Luc Girard
Michael Goldstein
Eric M. Gullikson
Russ Hudyma
Jim Kennon
Bob Kestner
Lou Marchetti
Patrick Naulleau
Regina Soufli
Eberhard Spiller
Keywords:
Numerical aperture
Extreme ultraviolet lithography
Optoelectronics
Materials science
Optics
projection optics
field exposure
Correction
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