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Channel direction impact of (110) surface Si substrate on performance improvement in sub-100 nm MOSFETs
Channel direction impact of (110) surface Si substrate on performance improvement in sub-100 nm MOSFETs
2003
Hidetatsu Nakamura
Tatsuya Ezaki
Toshiyuki Iwamoto
M. Togo
Nobuyuki Ikarashi
Masami Hane
Toyoji Yamamoto
Keywords:
Substrate (chemistry)
Performance improvement
Electronic engineering
Communication channel
Materials science
Optoelectronics
si substrate
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