Optical system and optical method for homogenizing the intensity of the laser radiation as well as plant for processing thin film layers

The optical system (10) for homogenizing the intensity of laser radiation comprising: - to form a beam shaping device (12) which is adapted to a laser beam (14) such that a beam profile (16, 36) of the laser beam (14). long axis (y) and a short axis (x) which is - a in the beam path of the laser beam (14) of the beam shaping means (12) downstream of the imaging device (18) which is arranged for imaging the thus shaped laser beam (14) as a line of illumination (22), and - an aperture means (30) with at least one aperture element (32, 32a, 32b) disposed in the beam path of the laser beam (14) in at least one side (34, 34a, 34b) of the beam profile (16, 36) extending long along the axis (y), which projects the beam profile (16, 36) such that by partially hide the beam profile (16, 36), the beam profile (16, 36) has a localized depression (38, 38a, 38b) on at least one side (34, 34a, 34b) of the beam profile (16, 36), marked by: - to determine a sensor device (40) which is adapted to a spatial intensity distribution (24, 24 ', 24' ') of the line of illumination (22), and to analyze a computer unit which is adapted to the spatial intensity distribution (24, 24 ', 24' ') of the line of illumination (22) with respect to an intensity maximum (26), - wherein the aperture means (30) is adapted on the basis of the analyzed intensity maximum (26) in the spatial intensity distribution (24, 24 ', 24' ') of the line of illumination (22) the at least one aperture element (32, 32a, 32b) spatially in such a way to arrange and / or the geometric shape of at least one screen member (32, 32a, 32b) to adjust such that by the localized recess (38, 38a, 38b) of the beam profile (16, 36) the intensity maximum (26) in the spatial intensity distribution (24, 24 ', 24' ') of the line of illumination (22) is at least partially compensated.