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Reactive etching by ClF 3 -Ar neutral cluster beam with scanning
Reactive etching by ClF 3 -Ar neutral cluster beam with scanning
2016
Toshio Seki
Yu Yoshino
Kunihiko Koike
Takaaki Aoki
Jiro Matsuo
Keywords:
Etching
Beam (structure)
Analytical chemistry
Chemistry
Materials science
Molecular physics
Correction
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