Real time analysis of ultra-thin CIGS thin film deposition

Thin films of Cu(In,Ga)Se 2 with various copper contents as functions of the copper and gallium contents were deposited by co-evaporation onto thermally oxidized silicon wafer (100). In-situ Real Time Spectroscopic Ellipsometry (RTSE) is used to understand the effect of the Ga/(In+Ga) ratio and the Cu atomic % on the growth and optical properties of ultra -thin CIGS films. We have demonstrated that RTSE can be used effectively to identify the growth process and to distinguish the effects of copper from those of gallium on the surface roughness evolution and dielectric functions.