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Plasma Deposition and Development of Ultralow-k Bilayer SiCNx/SiCNy Dielectric Cu Cap for 32 nm CMOS Devices
Plasma Deposition and Development of Ultralow-k Bilayer SiCNx/SiCNy Dielectric Cu Cap for 32 nm CMOS Devices
2009
Son Van Nguyen
Alfred Grill
S. Cohen
Hosadurga Shobha
N. Klymko
Eva E. Simonyi
Thomas J. Haigh
C.-K. Hu
Edward E. Adams
E. Liniger
Anita Madan
Thomas M. Shaw
E. Todd Ryan
Tien Cheng
Joshua L. Herman
Robert Young
Keywords:
Dielectric
Bilayer
CMOS
Plasma
Analytical chemistry
Materials science
plasma deposition
Optoelectronics
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