Origins of stress-induced perpendicular magnetic anisotropy of sputtered iron oxide thin films
1986
CoCr-doped γ-Fe 2 O 3 thin films prepared by RF sputtering and annealing processes exhibit stress-induced perpendicular magnetic anisotropy. This stress is found to be caused by both the ion bombardment on the film surface during sputter-deposition and the lattice misfit between the film and the substrate. The thermal effects play a less important role in causing stress in the films examined in this study.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
4
References
10
Citations
NaN
KQI