Preparation of dense films of crystalline ZrO2 by intense pulsed‐electron‐beam ablation

Intense pulsed electron beams with power densities of ∼109 W/cm2 were used to evaporate solid targets of ZrO2 and pure Zr. The deposition was carried out in an environment of O2 gas of 10 Pa. The high‐temperature plasma generated by intense pulsed electron beam contains energetic ions of target material and environmental gas O2. This ion flux vertical to and 2–4 mm away from the target was about 1014/cm2 per electron pulse for above power densities. The Raman spectra of ZrO2 thin films deposited on Si substrates by this technique showed their forms to consist of monoclinic, tetragonal, and cubic phases. Transmission electron microscope images showed that the ZrO2 films are even and dense, and corresponding diffraction patterns of the ZrO2 films revealed that the ZrO2 films have the microcrystalline structures in the forms of monoclinic and cubic phases.