WC-χ%Co films prepared by arc ion plating

WC-x%Co films (x = 0, 4, 15) were obtained by are ion plating (AIP). The deposition rate of the process and the surface microhardness of the films were measured. The microstructure of the films was analyzed by examining cross sections by scanning electron microscopy (SEM). It is demonstrated that the deposition of WC-x%Co films can be obtained by means of the proposed process. (C) 1998 Elsevier Science Ltd. All rights reserved.