Old Web
English
Sign In
Acemap
>
Paper
>
Substrate position dependence of characteristics of a-C:H films fabricated by Ar+CH 4 plasma
Substrate position dependence of characteristics of a-C:H films fabricated by Ar+CH 4 plasma
2019
S.H. Hwang
Kunihiro Kamataki
N. Itagaki
K. Koga
Masaharu Shiratani
Keywords:
Magazine
Chemical substance
Plasma
Imagination
Science, technology and society
Search engine
Analytical chemistry
Materials science
Substrate (chemistry)
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]