Uniform fabrication of thick SU-8 patterns on small-sized wafers for micro-optics applications

This paper reports on an alternative method for precise and uniform fabrication of 100μm-thick SU-8 microstructures on small-sized or non-circular samples. Standard spin-coating of high-viscosity resists is indeed known to induce large edge beads, leading to an air gap between the mask and the SU-8 photo-resist surface during UV photolithography. This results in a non uniform thickness deposition and in a poor pattern definition. This problem becomes highly critical in the case of small-sized samples. To overcome it, we have developed a soft thermal imprint method based on the use of a nano-imprint equipment and applicable whatever sample fragility, shape and size (from 2cm to 6 inches). After final photolithography, the SU8 pattern thickness variation profile is measured. Thickness uniformity is improved from 30% to 5% with a 5μm maximal deviation to the target value over 2cm-long samples.