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Novel GeO x Interface Layer Engineering by Ultra Low Power Microwave Plasma Oxidation
Novel GeO x Interface Layer Engineering by Ultra Low Power Microwave Plasma Oxidation
2016
Kentaro Shiraga
Junya Miyahara
Genji Nakamura
Yutaka Fujino
Koji Akiyama
K. Tapily
T Harada
E. Hara
A. Tanihara
N. Yamamoto
Yoshihiro Hirota
Takanobu Kaitsuka
T. Morimoto
K. Hasebe
Keywords:
Materials science
Ion source
Optoelectronics
interface layer
ultra low power
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