Neutral-Layer-Free Directed Self-Assembly of Block Copolymer in Trench Using Capillary Force-Induced Meniscus.

We propose trench-directed self-assembly of a block copolymer driven by a capillary force-induced meniscus as a facile scalable nanolithography method. Unlike conventional directed self-assembly methods, trench-directed self-assembly enables the achievement of neutral surface-free vertical orientations of the block copolymer nanopatterns irrespective of the polarizability of the substrate, which may be, for example, a ceramic (SiO2) on Semiconductor (Si). In our demonstration of the proposed method, we generated various morphologies of the block copolymer nanopatterns by varying the trench width, and molecular weight of the block copolymer. The proposed trench-directed self-assembly method is potentially advantageous for the design of a process/device layout required for the development of an effective manufacturing process.