New material measure for the calibration of areal-optical measuring instruments and its demands on fabrication

For nowadays and future resolution calibration tasks of areal-optical measuring instruments, micro structures with nanometer details, covering as most as possible of these instrument’s characteristics, are needed. Since current calibration measures do not fully satisfy all of these characteristics, we report on a newly chirped topography, that allows for the very first time for a holistic analysis of all the required attributes. To realize this highly resolved micro structure, e.g., an aberration-free laser lithography system will become indispensable in near future. Therefore, we’ve implemented a Gerchberg-Saxton based algorithm, improving any focal intensity distribution by the use of a so-called double-helix.