EUV lithography industrialization progress

This presentation will provide an overview of the industrialization of EUV Lithography, including the latest data on imaging, overlay, defectivity and source power/ productivity. The focus of the presentation will be on the NXE:3400B scanner, ASML’s fifth generation EUV lithography tool intended for the sub 10 nm volume production Furthermore the ASML roadmap, NXE:3300B and NXE:3350B field data and field performance data will be shown