Laser‐induced etching

Laser‐induced etching of metals, semiconductors, and other inorganic materials can be etched by ablation, localized heating to enhance a thermally activated chemical reaction, or photogeneration of a good etchant from a less reactive precursor. In addition, semiconductors can be etched following photoexcitation of the surface to produce free carrierrs. The advantages and disadvantages of these four approaches to laser‐induced etching are reviewed in this paper.