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Effect of SF6 Addition to BCl3 Etching Plasmas
Effect of SF6 Addition to BCl3 Etching Plasmas
1999
Yao-Sheng Lee
Kaushal Upadhyaya
Prasad Gogineni
Karen J. Nordheden
Keywords:
Reactive-ion etching
Etching
Electron beam-induced deposition
Plasma
Materials science
Atomic physics
Electron density
Correction
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