SRAF placement and sizing using inverse lithography technology
2007
The use of sub-resolution assist features (SRAFs) is a necessary and effective
technique to mitigate the proximity effects resulting from low-k1 imaging with
aggressive illumination schemes. This paper investigates the application of one
implementation of Inverse Lithography Technology (ILT) to determine optimized SRAF
placement and size. In contrast to traditional rule-based methods in which SRAF
placement and size are typically predetermined and frozen in place, unmodified during
OPC, ILT allows for the simultaneous placement and sizing of SRAFs during target
inversion to maximize image quality while also maintaining margin against sidelobe
printing. Furthermore, ILT enables SRAF placement for random as well as periodic
patterns. In this paper, SRAF placement using this approach is studied through
simulations. The computed mask and simulation results are shown to illustrate
effectiveness of ILT-generated SRAF features.
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