Continuous measurement of optical surfaces using a line-scan interferometer with sinusoidal path length modulation

We present a fast approach to the continuous measurement of rotational symmetric optical surfaces. This approach is based on a line scanning interferometer with sinusoidal modulation of the optical path length. The specimen is positioned with respect to the sensor and both are moved during measurement by use of a five axes system comprising a high precision rotational table. The calibration of both the line sensor as well as the scanning and positioning system is discussed. As proof of principle of the measurement and stitching concept results of a scan of a rotational symmetric sinusoidal structure and a spherical lens with a moderate slope are shown.