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High Aspect Ratio SiO2 Capillary Based On Silicon Etching and Thermal Oxidation Process for Optical Modulator
High Aspect Ratio SiO2 Capillary Based On Silicon Etching and Thermal Oxidation Process for Optical Modulator
2015
Nguyen Van Toan
Suguru Sangu
T Saitoh
Naoki Inomata
Takahito Ono
Keywords:
Aspect ratio (aeronautics)
Capillary action
Thermal oxidation
Etching
Optical modulator
Silicon
Materials science
Optoelectronics
silicon etching
Correction
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