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Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
2003
Harald Kraus
James Snow
P. Van Doorne
Paul Mertens
Francis Kovacs
Keywords:
Chemical vapor deposition
Silicon nitride
Etching
Etching (microfabrication)
Composite material
Ceramic materials
Materials science
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