The effect of oxygen partial pressure and substrate temperature on the structural and optical properties of ZnOnanowires

In this paper ZnO thin films were prepared by radio frequency reactive magnetron sputtering on p-type silicon (100) and glass substrates by varying the different substrate temperatures and different oxygen partial pressure and study the structural, compositional, microstructrue, morphological and optical properties by X-ray diffraction, scanning electron microscopy, atomic microscopy and UV-Vis-NIR spectrophotometer. The X- Ray diffraction results confirmed that the films consists of ZnO peaks of (100), (002) and (110). The Fourier transform infrared spectrum confirms the presence of Zn-O bonding at wave number of 413 cm-1. The SEM analysis confirms that the films formed at oxygen partial p…