Secondary Electron Yield of Nano-Thick Aluminum Oxide and its Application on MCP Detector
2017
Nano-thick aluminum oxide thin film was deposited by atomic layer deposition (ALD) technique. The secondary electron properties of such thin film have been studied by pulsed-yield measurement. Conventional lead glass microchannel plate (MCP) was coated with such thin film. The gain, the single electron resolution and the peak-to-valley ratio of the new MCP detector were improved.
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