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Thermal deposition of titanium nitride by MOCVD using Ti(Net2)4
Thermal deposition of titanium nitride by MOCVD using Ti(Net2)4
2013
Chloé Jimenez
M. Joubert
Fabien Piallat
R. Gassilloud
P. Michallon
B. Pelissier
Christophe Lachaud
J.M. Decams
Keywords:
Titanium nitride
Metalorganic vapour phase epitaxy
thermal deposition
Metallurgy
Materials science
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