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Deposition and properties of highly c-oriented of InN films on sapphire substrates with ECR-plasma-enhanced MOCVD
Deposition and properties of highly c-oriented of InN films on sapphire substrates with ECR-plasma-enhanced MOCVD
2012
Qin
Fuwen
Zhang
Dong
Bai
Yizhen
Ju
Zhenhe
Li
Shuangmei
Yucai
Pang
Jiaqi
Bian
Jiming
Keywords:
Plasma
Optoelectronics
Deposition (chemistry)
Metalorganic vapour phase epitaxy
Sapphire
Materials science
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