30-nm Inverted $\hbox{In}_{0.53}\hbox{Ga}_{0.47} \hbox{As}$ MOSHEMTs on Si Substrate Grown by MOCVD With Regrown Source/Drain

We report inverted-type In 0.51 Al 0.49 As/In 0.53 Ga 0.47 As MOSHEMTs grown by MOCVD on a Si substrate. n ++ InGaAs with an electron density of 4.5 × 10 19 cm -3 was selectively regrown in the source/drain regions to reduce parasitic resistance while eliminating the conventional gate recess etching. A 30-nm-channel-length device was successfully demonstrated with a maximum drain current of 1698 mA/mm, a peak transconductance of 1074 mS/mm at V ds = 0.5 V, a subthreshold slope of 172 mV/dec at V ds = 0.05 V, and a record-low on-resistance of 133 Ω·μm. An effective mobility of 4805 cm 2 /V· s was also extracted, indicating the high-quality metamorphic growth by MOCVD. In addition, the scalability of the inverted MOSHEMT on a Si substrate from 1 μm down to 30 nm was investigated.