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Tunneling currents and reliability of atomic-layer-deposited SiBCN for low-κ spacer dielectrics
Tunneling currents and reliability of atomic-layer-deposited SiBCN for low-κ spacer dielectrics
2014
Richard G. Southwick
Rajesh Sathiyanarayanan
Mohit Bajaj
Sanjay Mehta
Tenko Yamashita
Suresh Gundapaneni
Rajan K. Pandey
Ernest Y. Wu
Kota V. R. M. Murali
S. Cohen
James H. Stathis
Keywords:
Dielectric
High-κ dielectric
Electronic engineering
Quantum tunnelling
Physics
Engineering
Correction
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