ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance

A newly designed ArF immersion lightsource, GT66A is required to provide yield improvement on highly complexed multiple-patterning lithography and additional productivity to the chip makers. The DUV lightsource prospective, EPE needed to be paid attention in order to reduce LER/ LWR, Line Narrowing Module (LNM) demonstrates E95% stability improvement providing further OVL/ CDU improvement. In order to improve tool availability, GT66A key modules including LNM provides up to 50% expected life extension. Therefore, GT66A enables to provide high in availability with improved optical property for EPE enhancement simultaneously.