Multilayered ZnO Films of Improved Quality Deposited by Magnetron Sputtering

Multilayered ZnO fllms were deposited by rf magnetron sputtering onsilicon and sapphire substrates. The aim of this work is to improve structuralquality of ZnO thin fllms grown on just listed substrates. Presented X-raydifiraction data testify to remarkable relaxation of compressive stress in two-and three-layered ZnO fllms in comparison with single-layer one.PACS numbers: 81.05.Dz, 81.15.Cd, 61.05.cp, 68.55.jm