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NMOS Current Enhancement and Layout Dependency Improvement by Using Atomic Layer Deposition SIN Spacer
NMOS Current Enhancement and Layout Dependency Improvement by Using Atomic Layer Deposition SIN Spacer
2007
H. Nagai
K. Ookoshi
H. Morioka
T. Mori
M. Kojima
Y. Takao
M. Kase
K. Hashimoto
Keywords:
NMOS logic
Atomic layer deposition
Analytical chemistry
Materials science
Optoelectronics
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