Perturbation of the Heat Lateral Diffusion by Interface Resistance in Layered Structures

2015 
It is well established that interface resistances do usually exist in layered structures, and their values strongly depend on their origin. They may arise from different vibrational properties of the layers, nonharmonic processes at the interface, surface chemical contamination, interfacial defects, etc. Numerous studies have been published to evaluate their values, most of the time, in a perpendicular heat diffusion scheme. In this paper, the effect of interface resistances on the lateral modulated surface temperature of a layered structure for cylindrical symmetry heat diffusion is studied. The thermoreflectance microscope is a particularly convenient tool to record heat lateral diffusion from a surface modulated heated point and thus to evidence the presence of such resistance interfaces. In a first part, the theoretical model of heat diffusion in cylindrical symmetry, in a layered structure exhibiting an interface resistance between the layer and the substrate, is briefly described. In a second part, the C/I configuration (good conductive layer deposited on an insulating substrate, with an interface resistance) is investigated. Experimental results illustrate the theory. In the third part, the reverse case I/C (insulating layer deposited on a conductive substrate, with an interface resistance) is discussed. To conclude, all the cases and the ability of the lateral diffusion to recover interface thermal resistances are compared.
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