Negative tone microlithographic resist composition and microlithographic relief image forming method

1994 
PURPOSE: To minimize the diffusion of an acid from an exposed region to an unexposed region and to assist the maintenance of the dimensional control of a relief image. CONSTITUTION: This negative tone microlithographic resist compsn. is a mixture contg. a binder contg. a hydroxy substd. arom. polymer such as polyhydroxystyrene resin, a crosslinking agent forming carbonium ions by reaction with a strong acid catalyst and not plasticizing the polymer binder at the time of mixing and an acid generating compd. which forms a strong acid when exposed to radiation. The binder is soluble in an aq. alkali developing soln. and is crosslinked by reaction with the crosslinking agent so that it is made practically insoluble in the developing soln.
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