A beamline for layered synthetic microstructure studies

Abstract Layered synthetic microstructures (LSMs) have become an important X-ray optics component. The high reflectivity shown at large incidence angles in the XUV region allows for the design of efficient optical elements. LSMs, however, may be exposed to exceedingly large power densities during normal operation. This is particularly true in the case of the new storage rings under development, where LSM front optics are necessary in order to alleviate thermal loading of other elements. High reflectivity and long term stability are both key issues for successful applications to synchrotron radiation optics. The production of LSMs with high reflectivity depends critically on growth conditions, substrate preparation, and metallurgical properties of the materials involved. It then becomes necessary to characterize the properties of LSMs from the point of view of the material properties in order to improve the fabrication process. These include problems such as film structure, interfacial roughness, and intermixing. Large radiation doses may enhance defect formation and interdiffusion processes, thus leading to decreased performance. For these reasons we have begun a series of experiments to determine (a) the effect of growth conditions on LSM reflectivities and (b) the effect of large radiation doses on the LSM reflectivities. In this paper we will report results of LSM characterization and describe the beamline that we are preparing for more extensive studies.