Compositional Modulation in InxGa1-xN

Compositional Modulation in In x Ga 1-x N Z. Liliental-Weber a , D. N. Zakharov a , K. M. Yu a , J. W. Ager III a , W.Walukiewicz a , E. E. Haller a,b , H. Lu c , and W.J. Schaff c Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA Materials Science and Engineering, University of California, Berkeley, Berkeley, CA 94720, USA Department of Electrical and Computer Engineering, Cornell University, Ithaca, NY 14853, USA Abstract Transmission Electron Microscopy and x-ray diffraction were used to study compositional modulation in In x Ga 1-x N layers grown with compositions close to the miscibility gap. The samples (0.34 < x < 0.8) were deposited by molecular beam epitaxy using either a 200-nm-thick AlN or GaN buffer layer grown on a sapphire substrate. In the TEM imaging mode this modulation is seen as black/white fringes which can be considered as self-assembled thin quantum wells. Periodic compositional modulation leads to extra electron diffraction spots and satellite reflections in x-ray diffraction in the θ−2θ coupled geometry. The modulation period was determined using both methods. Larger modulation periods were observed for layers with higher In content and for those having larger mismatch with the underlying AlN buffer layer. Compositional modulation was not observed for a sample with x = 0.34 grown on a GaN buffer layer. Modulated films tend to have large “ Stokes shifts” between their absorption edge and photoluminescence peak. Key words: compositional modulation, InGaN, TEM, x-ray Corresponding author: Zuzanna Liliental-Weber Address: Lawrence Berkeley National Laboratory 1 Cyclotron Rd BERKELEY, CA 94720 Phone number: 510-486-6276 Fax number: 510-486-4995 e-mail:z_liliental-weber@lbl.gov